Femtika Laser Nanofactory MPP Multiphoton Polymerization
Introduction to Multiphoton Polymerization: Multiphoton polymerization (MPP) is a 3D printing technique capable of fabricating polymer structures of arbitrary shape with sub-micron resolution. The process begins by dispensing a polymer material mixed with a photoinitiator onto a glass slide, followed by pre-baking to form a photoresist layer. A laser direct-writing system is then used to create the 3D microstructure; under laser irradiation, the polymer cures and hardens at the irradiated sites through a process known as photopolymerization. Finally, the microstructure is immersed in an organic solvent to develop the unpolymerized photoresist. MPP is commonly employed in the fabrication of microelectronic devices because it enables the creation of extremely small, high-precision features. Moreover, due to the highly focused nature of the laser beam, it can be used to produce complex 3D geometries. Equipment Parameters: Additive manufacturing materials include SZ2080, SU-8, Ormocers, Glassomer, hybrid organic–inorganic materials, photopolymers, elastomers, and proteins. Minimum XY feature size: 150 nm; minimum surface roughness Ra ≤ 20 nm; maximum build speed: 30 mm/s. (3) Key Advantages and Highlights: ● Nanometer-resolution additive manufacturing technology ● True 3D structures at the micrometer scale ● Wide range of available polymers ● Error-free, seamless fabrication
Femtika Laser Nanofactory SLE Selective Laser Etching
Selective Laser Etching (1) Introduction: Selective laser etching is a laser-based subtractive manufacturing technique that enables the fabrication of complex three-dimensional glass components with micrometer-level precision. The process comprises two manufacturing steps: femtosecond laser irradiation followed by chemical etching. A tightly focused femtosecond laser beam induces modifications in the transparent material at the focal point. By spatially scanning the laser focus, the desired structure is written point by point across the substrate surface. Subsequently, the sample is immersed in an etchant solution, which selectively removes the laser-modified regions. SLE is commonly employed in the production of electronic devices and other precision components because it delivers superior accuracy and detail in the etched patterns. Moreover, due to the high degree of beam focusing, it can be used to etch extremely small and intricate designs. Equipment parameters, technical principles, and subtractive manufacturing; materials: fused silica, Borofloat 33; minimum feature size: >1 μm; minimum surface roughness: <200 nm; maximum object height: 1 cm; aspect ratio: >1:200; minimum microhole diameter: 5 μm; writing speed: 50 mm/s. Key advantages: ● Subtractive manufacturing technology ● Fabrication of three-dimensional glass structures of arbitrary shapes spanning from the micrometer to the centimeter scale ● Compatibility with a wide range of glass types ● Self-alignment system for automated laser-beam alignment ● Micrometer-level feature resolution
FEMTKA Multiphoton Micro- and Nano-Additive-Subtractive Hybrid Manufacturing Platform
Femtosecond lasers are highly versatile tools that can be used for a wide range of microfabrication processes. Each process has specific requirements regarding the laser parameters, beam delivery, and material properties. Our Laser Nanofabrication Workstation supports hybrid manufacturing, meaning that multiple processes can be performed using the same equipment. The two most commonly used processes are multiphoton polymerization and selective glass etching, but these are by no means the only ones! By precisely tuning the process parameters, the same machine can accommodate a broader array of fabrication techniques.
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