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Aerosol Jet Printing Technology
Ultrasonic Atomization Powder-Production Technology
Electronics Materials and Energy Storage MORE >JACS: Micrometer-Level Precision—Aerosol Jet Printing Enables Controlled Patterning and Compositing of COF Thin Films “Adv. Funct. Mater.”: MXene Microsupercapacitors Fabricated via Aerosol Jet Printing for Flexible, Washable Textile Energy Storage “Small”: MXene 3D-AJP—Realizing a Three-Dimensional, Oriented, Free-Form Network of Two-Dimensional MXene Nanosheets via Aerosol 3D PrintingSensor and Internet of Things Field MORE >Small Methods: High-Performance MXene Microsupercapacitor Fabrication Technology Based on Aerosol Jet Printing Small Methods: A Low Environmental Footprint, Non-Sensitive Disposable Humidity and Temperature Sensor Fabricated via Aerosol Jet Printing on Cellulose Substrates npj Advanced Manufacturing: Aerosol Jet Printing Empowers All-Bio-Based Humidity Sensors to Tackle the Challenge of Electronic Waste
Femtika Laser Nanofactory MPP Multiphoton Polymerization
Introduction to Multiphoton Polymerization: Multiphoton polymerization (MPP) is a 3D printing technique capable of fabricating polymer structures of arbitrary shapes with sub-micron resolution. First, a polymer material mixed with a photoinitiator is dispensed onto a glass slide and pre‑baked to form a photoresist layer. A laser direct‑write process is then employed to create 3D microstructures. Under laser irradiation, the polymer hardens at the irradiated sites through a process known as photopolymerization. Finally, the microstructure is immersed in an organic solvent to develop the unexposed photoresist. MPP is commonly used in the fabrication of microelectronic devices because it enables the creation of extremely small, high‑precision features. Moreover, thanks to the highly focused beam, it can produce complex 3D geometries. Equipment Parameters: Additive manufacturing materials include SZ2080, SU‑8, Ormocers, Glassomer, hybrid organic–inorganic materials, photopolymers, elastomers, and proteins. Minimum XY feature size: 150 nm; minimum surface roughness: Ra ≤ 20 nm; maximum build speed: 30 mm/s. Key Advantages: ● Nanoscale‑resolution additive manufacturing technology ● True 3D microstructures at the micrometer scale ● Wide range of available polymers ● Error‑free, seamless fabrication
Femtika Laser Nanofactory SLE: Selective Laser Etching
The Femtika Laser Nanofactory SLE model is a femtosecond laser subtractive manufacturing system specialized in fabricating three-dimensional microstructures within transparent, brittle materials, particularly glass. It primarily employs a process that combines femtosecond laser‑induced modification with chemical etching, enabling high‑precision 3D patterning of materials such as fused silica and borosilicate glass.
FEMTKA Multiphoton Micro- and Nanoscale Additive–Subtractive Hybrid Manufacturing Platform
Femtosecond lasers are highly versatile tools that can be employed in a wide range of microfabrication processes. Each process has specific requirements regarding the laser, beam delivery, and material properties. Our laser nanofabrication workstation enables hybrid manufacturing, meaning that multiple processes can be supported by the same equipment. The two most commonly used techniques are multiphoton polymerization and selective glass etching, but these are far from the only ones! By precisely tuning its parameters, the same machine can perform an even broader array of processes.
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